Members' Processes |
| Equipment |
Semitool: Plating, Thinning (wet-etch based) |
Alcatel: Via Etch, Dicing (dry-etch based) |
XSiL: Via Drill, dicing (laser-drill based) |
EVG: Stacking, Alignment, Resist process |
Isonics: Sequential Wafer Thinning |
| Materials |
Rohm and Haas PFT: Plating chemicals |
AZ: Photoresists |
Enthone: Plating chemicals |
Brewer Science : Adhesives |
| R&D Partners |
SAIT (Samsung Institute of Technology): Sensors/MEMS/Chip stacking |
Fraunhofer IZM: Sensors/MEMS/Chip Stacking |
KAIST (Korea Advanced Institute of Science and Technology): Chip stacking |
TAMU (Texas A&M University): Electrochemical Studies |
CEA-Leti: Sensors/MEMS/Chip Stacking |
NXP: Sensors/MEMS/Chip Stacking |